
EUV lithography systems – Products | ASML
The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will support advanced Logic and Memory chip production.
ASML products & services | Supplying the semiconductor industry
Explore ASML products and services that optimize the chip-making process, including our advanced lithography machines and metrology tools.
ASML | The world's supplier to the semiconductor industry
We have the largest ASML manufacturing site in Asia as well as two training centers, play an essential role in the rapidly growing e-beam market, and work closely with TSMC and major semiconductor fabs.
DUV lithography systems | Products - ASML
ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.
ASML technology | Supplying the semiconductor industry
Jan 25, 2024 · Learn about the technology behind ASML lithography systems and other products, used to improve the chip-making process and push the industry forward.
Mechanics & mechatronics - Lithography principles | ASML
In an ASML lithography machine, the stage moves two wafer tables simultaneously, each holding a silicon wafer. While one wafer is being exposed, the position of the other wafer is measured by the …
About ASML | Supplying the semiconductor industry
ASML is one of the world’s leading manufacturers of chip-making equipment. It’s a common misconception that we make chips, also called microchips or integrated circuits (ICs), but we actually …
TWINSCAN NXE:3400C – EUV lithography systems | ASML
Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability …
TWINSCAN NXT:2150i - DUV lithography machines | ASML
The dual-stage ArF immersion lithography system offers better overlay and imaging performance at higher productivity and with less process complexity.
TWINSCAN NXE:3600D - EUV lithography systems | ASML
This takes place at high throughput, because ASML TWINSCAN systems allow for the measurement of wafer characteristics at the metrology position, while another just-measured wafer is being exposed.