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  1. EUV lithography systems – Products | ASML

    The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will support advanced Logic and Memory chip production.

  2. ASML products & services | Supplying the semiconductor industry

    Explore ASML products and services that optimize the chip-making process, including our advanced lithography machines and metrology tools.

  3. ASML | The world's supplier to the semiconductor industry

    We have the largest ASML manufacturing site in Asia as well as two training centers, play an essential role in the rapidly growing e-beam market, and work closely with TSMC and major semiconductor fabs.

  4. DUV lithography systems | Products - ASML

    ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.

  5. ASML technology | Supplying the semiconductor industry

    Jan 25, 2024 · Learn about the technology behind ASML lithography systems and other products, used to improve the chip-making process and push the industry forward.

  6. Mechanics & mechatronics - Lithography principles | ASML

    In an ASML lithography machine, the stage moves two wafer tables simultaneously, each holding a silicon wafer. While one wafer is being exposed, the position of the other wafer is measured by the …

  7. About ASML | Supplying the semiconductor industry

    ASML is one of the world’s leading manufacturers of chip-making equipment. It’s a common misconception that we make chips, also called microchips or integrated circuits (ICs), but we actually …

  8. TWINSCAN NXE:3400C – EUV lithography systems | ASML

    Combining high productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the TWINSCAN NXE:3400C provides lithography capability …

  9. TWINSCAN NXT:2150i - DUV lithography machines | ASML

    The dual-stage ArF immersion lithography system offers better overlay and imaging performance at higher productivity and with less process complexity.

  10. TWINSCAN NXE:3600D - EUV lithography systems | ASML

    This takes place at high throughput, because ASML TWINSCAN systems allow for the measurement of wafer characteristics at the metrology position, while another just-measured wafer is being exposed.