Since the groundbreaking discovery of graphene in 2004, the dizzying pace of progress in two-dimensional (2D) materials has ushered in a new era of fundamental research and technological innovation.

Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...

Researchers with the Department of Energy's Oak Ridge National Laboratory and the University of Tennessee, Knoxville, have created an innovative method to visualize and analyze atomic structures ...

Researchers have pioneered a groundbreaking method for the high-speed, large-area deposition of 2D materials. This innovative technique was discovered by chance; however, it promises to revolutionize ...

A popular 2D active material, molybdenum disulfide (MoS 2), just got a platinum upgrade at an atomic level. A study led by researchers from the University of Vienna and Vienna University of Technology ...

Researchers have created an innovative method to visualize and analyze atomic structures within specially designed, ultrathin bilayer 2D materials. (Nanowerk News) Researchers with the Oak Ridge ...

Continuous downscaling of the critical dimensions in semiconductor devices is the cornerstone of technological revolution. As the technology nodes keep shrinking, innovations in fabrication ...

Transition metal oxides host a rich variety of strongly correlated electronic phases, including high-temperature superconductivity, ferromagnetism, antiferromagnetism, and charge density waves. These ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

On the left is an artistic depiction of a twisted double layer forming a moiré pattern created by overlapping 2D sheets; each layer’s structure is shown separately on the right. Researchers with the ...